Issued Patents 2024
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12181798 | Extreme ultraviolet photolithography method with developer composition | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2024-12-31 |
| 12174540 | Method of manufacturing a semiconductor device | Ching-Yu Chang | 2024-12-24 |
| 12106961 | Humidity control or aqueous treatment for EUV metallic resist | Yahru Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2024-10-01 |
| 12074025 | Photoresist developer and method of developing photoresist | Ming-Hui Weng, Ching-Yu Chang, Chen-Yu Liu | 2024-08-27 |
| 12050404 | Photoresist with polar-acid-labile-group | Ching-Yu Chang | 2024-07-30 |
| 12019375 | Photosensitive material and method of lithography | Ching-Yu Chang, Chien-Wei Wang | 2024-06-25 |
| 12009210 | Method of manufacturing a semiconductor device | Ching-Yu Chang, Chin-Hsiang Lin | 2024-06-11 |
| 11971657 | Photoresist developer and method of developing photoresist | Chin-Hsiang Lin, Ching-Yu Chang, Yahru Cheng | 2024-04-30 |
| 11942322 | Method of manufacturing semiconductor devices and pattern formation method | Chun-Chih HO, Yahru Cheng, Ching-Yu Chang | 2024-03-26 |
| 11934101 | Photoresist composition and method of forming photoresist pattern | Ching-Yu Chang | 2024-03-19 |