KS

Kirankumar Neelasandra SAVANDAIAH

Applied Materials: 11 patents #20 of 1,809Top 2%
Overall (2024): #6,565 of 561,600Top 2%
12
Patents 2024

Issued Patents 2024

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12183560 Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process Shane Lavan, Sundarapandian Ramalinga Vijayalakshmi REDDY, Randal Dean Schmieding, Yong Cao 2024-12-31
12100614 Apparatus for controlling lift pin movement Anubhav Srivastava, Bhaskar PRASAD, Thomas Brezoczky, Nitin Bharadwaj SATYAVOLU 2024-09-24
12080571 Substrate processing module and method of moving a workpiece Srinivasa Rao YEDLA, Thomas Brezoczky 2024-09-03
D1040304 Deposition ring for physical vapor deposition chamber David Gunther, Cheng-Hsiung Tsai 2024-08-27
12043896 Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure Srinivasa Rao YEDLA, Nitin Bharadwaj SATYAVOLU, Ganesh Subbuswamy, Devi Raghavee Veerappan, Thomas Brezoczky 2024-07-23
12027354 Cleaning of SIN with CCP plasma or RPS clean Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more 2024-07-02
12002668 Thermal management hardware for uniform temperature control for enhanced bake-out for cluster tool Srinivasa Rao YEDLA, Thomas Brezoczky, Hari Prasath Rajendran 2024-06-04
11961723 Process kit having tall deposition ring for PVD chamber David Gunther, Cheng-Hsiung Tsai 2024-04-16
11955355 Isolated volume seals and method of forming an isolated volume within a processing chamber Nitin Bharadwaj SATYAVOLU, Srinivasa Rao YEDLA, Bhaskar PRASAD, Thomas Brezoczky 2024-04-09
11935732 Process kit geometry for particle reduction in PVD processes Adolph Miller Allen, Randal Dean Schmieding, Vanessa Faune 2024-03-19
11915918 Cleaning of sin with CCP plasma or RPS clean Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more 2024-02-27
11898236 Methods and apparatus for processing a substrate Zhiyong Wang, Halbert Chong, John C. Forster, Irena H. Wysok, Tiefeng Shi +9 more 2024-02-13