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Arc management algorithm of RF generator and match box for CCP plasma chambers |
Tiefeng Shi, Gang Fu |
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| 12104347 |
Coupler |
Gary Miller, Gavin Urwin, Chris Bradley, Chris LEWIS, Howard Reay |
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| 12094699 |
Methods and apparatus for controlling ion fraction in physical vapor deposition processes |
Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, William Fruchterman +4 more |
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| D1037954 |
Self-retained low friction pad |
Ilya Lavitsky |
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| 12027354 |
Cleaning of SIN with CCP plasma or RPS clean |
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| 12018361 |
Waveform shape factor for pulsed PVD power |
Shouyin Zhang |
2024-06-25 |
| 12014906 |
High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber |
William Johanson, Cheng-Hsiung Tsai, John C. Forster, Mukund Sundararajan |
2024-06-18 |
| D1026054 |
Collimator for a physical vapor deposition (PVD) chamber |
Martin Lee Riker, Luke Vianney Varkey, Xiangjin Xie, Kishor Kalathiparambil |
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| 11915918 |
Cleaning of sin with CCP plasma or RPS clean |
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| 11898236 |
Methods and apparatus for processing a substrate |
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| 11868147 |
Optical emission spectroscopy control of gas flow in processing chambers |
Philip DiGiacomo, Sunil Kumar Garg, Paul Kiely, Rajat Agrawal |
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| D1009816 |
Collimator for a physical vapor deposition chamber |
Martin Lee Riker, Fuhong Zhang, Luke Vianney Varkey, Kishor Kalathiparambil, Xiangjin Xie |
2024-01-02 |
