Issued Patents 2023
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11851756 | Methods for depositing silicon-containing films | Ming Li, Raymond Nicholas Vrtis, Robert Gordon Ridgeway, Manchao Xiao | 2023-12-26 |
| 11742200 | Composition and methods using same for carbon doped silicon containing films | Haripin Chandra, Anupama Mallikarjunan, Moo-Sung Kim | 2023-08-29 |
| 11732351 | Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films | Moo-Sung Kim, Jianheng Li | 2023-08-22 |
| 11725111 | Compositions and processes for depositing carbon-doped silicon-containing films | Manchao Xiao, Ronald Martin Pearlstein, Haripin Chandra, Eugene Joseph Karwacki, Jr., Bing Han +1 more | 2023-08-15 |
| 11713328 | Stable alkenyl or alkynyl-containing organosilicon precursor compositions | Robert Gordon Ridgeway, Raymond Nicholas Vrtis, Madhukar Bhaskara Rao, Steven Gerard Mayorga, Neil Osterwalder +2 more | 2023-08-01 |
| 11702743 | Trisilylamine derivatives as precursors for high growth rate silicon-containing films | Matthew R. MacDonald, Meiliang Wang | 2023-07-18 |
| 11649547 | Deposition of carbon doped silicon oxide | Meiliang Wang, Haripin Chandra, Matthew R. MacDonald | 2023-05-16 |
| 11631580 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | Matthew R. MacDonald, Moo-Sung Kim, Se Won Lee | 2023-04-18 |
| 11626279 | Compositions and methods for making silicon containing films | Anupama Mallikarjunan, Andrew David Johnson, Meiliang Wang, Raymond Nicholas Vrtis, Bing Han +1 more | 2023-04-11 |
| 11605535 | Boron-containing compounds, compositions, and methods for the deposition of a boron containing films | Moo-Sung Kim | 2023-03-14 |
| 11591692 | Organoamino-polysiloxanes for deposition of silicon-containing films | Manchao Xiao, Matthew R. MacDonald, Daniel P. Spence, Meiliang Wang, Suresh K. Rajaraman | 2023-02-28 |
| 11584854 | Compositions and methods for the deposition of silicon oxide films | Meiliang Wang, Matthew R. MacDonald, Richard Ho, Manchao Xiao, Suresh K. Rajaraman | 2023-02-21 |