Issued Patents 2023
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11854769 | Adjustable fastening device for plasma gas injectors | Yung-Shun Hsu, Chiao-Kai Chang, Wai Hong Cheah, Chien-Fang Lin | 2023-12-26 |
| 11854798 | Semiconductor device and method | Jei-Ming Chen, Tze-Liang Lee | 2023-12-26 |
| 11822251 | Photoresist with polar-acid-labile-group | An-Ren Zi | 2023-11-21 |
| 11822238 | Extreme ultraviolet photolithography method with developer composition | An-Ren Zi, Joy Cheng, Chin-Hsiang Lin | 2023-11-21 |
| 11822237 | Method of manufacturing a semiconductor device | Ming-Hui Weng, Chen-Yu Liu, Chih-Cheng Liu, Yi-Chen Kuo, Jia-Lin WEI +5 more | 2023-11-21 |
| 11796918 | Underlayer material for photoresist | An-Ren Zi, Wei-Han Lai | 2023-10-24 |
| 11784046 | Method of manufacturing a semiconductor device | Jia-Lin WEI, Ming-Hui Weng, Chih-Cheng Liu, Yi-Chen Kuo, Yen-Yu Chen +4 more | 2023-10-10 |
| 11782345 | Bottom antireflective coating materials | Chien-Chih Chen | 2023-10-10 |
| 11774855 | Lithography patterning technique | Lilin Chang | 2023-10-03 |
| 11762296 | Method and apparatus of patterning a semiconductor device | An-Ren Zi | 2023-09-19 |
| 11754923 | Resist dispensing system and method of use | Ya-Ching Chang, Chen-Yu Liu, Chin-Hsiang Lin | 2023-09-12 |
| 11728161 | Spin on carbon composition and method of manufacturing a semiconductor device | Jing Hong Huang, Wei-Han Lai | 2023-08-15 |
| 11714355 | Photoresist composition and method of forming photoresist pattern | Li-Po YANG, Wei-Han Lai | 2023-08-01 |
| 11708495 | Priming material for substrate coating | Chen-Yu Liu | 2023-07-25 |
| 11705332 | Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern | Yi-Chen Kuo, Chih-Cheng Liu, Ming-Hui Weng, Jia-Lin WEI, Yen-Yu Chen +4 more | 2023-07-18 |
| 11703765 | Photoresist composition and method of manufacturing a semiconductor device | Tzu-Yang Lin, Chin-Hsiang Lin | 2023-07-18 |
| 11703766 | Materials and methods for forming resist bottom layer | Jing Hong Huang, Chien-Wei Wang, Shang-Wern Chang | 2023-07-18 |
| 11694896 | Photoresist developer and method of developing photoresist | Ming-Hui Weng, An-Ren Zi, Chen-Yu Liu | 2023-07-04 |
| 11681226 | Metal-compound-removing solvent and method in lithography | An-Ren Zi, Joy Cheng | 2023-06-20 |
| 11681221 | EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands | An-Ren Zi, Chen-Yu Liu | 2023-06-20 |
| 11676852 | Patterning methods for semiconductor devices | Wei-Ren Wang, Shing-Chyang Pan, Wan-Lin Tsai, Jung-Hau Shiu, Tze-Liang Lee | 2023-06-13 |
| 11670490 | Integrated circuit fabrication system with adjustable gas injector | Yung-Shun Hsu, Chiao-Kai Chang, Wai Hong Cheah, Chien-Fang Lin | 2023-06-06 |
| 11656553 | Method for forming semiconductor structure | Li-Yen Lin, Chin-Hsiang Lin | 2023-05-23 |
| 11658120 | Porogen bonded gap filling material in semiconductor manufacturing | Bo-Jiun Lin, Hai-Ching Chen, Tien-I Bao | 2023-05-23 |
| 11626285 | Method of manufacturing a semiconductor device | An-Ren Zi, Chin-Hsiang Lin | 2023-04-11 |