Issued Patents 2023
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11822251 | Photoresist with polar-acid-labile-group | Ching-Yu Chang | 2023-11-21 |
| 11822238 | Extreme ultraviolet photolithography method with developer composition | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2023-11-21 |
| 11796918 | Underlayer material for photoresist | Wei-Han Lai, Ching-Yu Chang | 2023-10-24 |
| 11762296 | Method and apparatus of patterning a semiconductor device | Ching-Yu Chang | 2023-09-19 |
| 11694896 | Photoresist developer and method of developing photoresist | Ming-Hui Weng, Ching-Yu Chang, Chen-Yu Liu | 2023-07-04 |
| 11681226 | Metal-compound-removing solvent and method in lithography | Joy Cheng, Ching-Yu Chang | 2023-06-20 |
| 11681221 | EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands | Chen-Yu Liu, Ching-Yu Chang | 2023-06-20 |
| 11626285 | Method of manufacturing a semiconductor device | Ching-Yu Chang, Chin-Hsiang Lin | 2023-04-11 |
| 11605538 | Protective composition and method of forming photoresist pattern | Ching-Yu Chang, Chin-Hsiang Lin | 2023-03-14 |