Issued Patents 2023
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11846013 | Methods and apparatus for extended chamber for through silicon via deposition | David Gunther, Jiao Song, Irena H. Wysok, Anthony Chih-Tung Chan | 2023-12-19 |
| D1007449 | Target profile for a physical vapor deposition chamber target | David Gunther, Jiao Song, Madan Kumar Shimoga Mylarappa, Yue Cui, Nuno Yen-Chu Chen +1 more | 2023-12-12 |
| 11817331 | Substrate holder replacement with protective disk during pasting process | Srinivasa Rao YEDLA, Thomas Brezoczky, Bhaskar PRASAD, Nitin Bharadwaj SATYAVOLU | 2023-11-14 |
| 11749542 | Apparatus, system, and method for non-contact temperature monitoring of substrate supports | Bhaskar PRASAD, Thomas Brezoczky, Srinivasa Rao YEDLA | 2023-09-05 |
| 11674227 | Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure | Srinivasa Rao YEDLA, Nitin Bharadwaj SATYAVOLU, Ganesh Subbuswamy, Devi Raghavee Veerappan, Thomas Brezoczky | 2023-06-13 |
| 11646217 | Transfer apparatus and substrate-supporting member | Anubhav Srivastava, Bhaskar PRASAD, Thomas Brezoczky, Srinivasa Rao YEDLA, Lakshmikanth Krishnamurthy SHIRAHATTI | 2023-05-09 |
| 11610799 | Electrostatic chuck having a heating and chucking capabilities | Bhaskar PRASAD, Srinivasa Rao YEDLA, Nitin Bharadwaj SATYAVOLU, Hari Prasath Rajendran, Lakshmikanth Krishnamurthy SHIRAHATTI +1 more | 2023-03-21 |
| 11600507 | Pedestal assembly for a substrate processing chamber | Bhaskar PRASAD, Srinivasa Rao YEDLA, Nitin Bharadwaj SATYAVOLU, Thomas Brezoczky | 2023-03-07 |
| 11600477 | Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process | Shane Lavan, Sundarapandian Ramalinga Vijayalakshmi REDDY, Randal Dean Schmieding, Yong Cao | 2023-03-07 |
| 11581166 | Low profile deposition ring for enhanced life | Jiao Song, David Gunther, Irena H. Wysok, Anthony Chih-Tung Chan | 2023-02-14 |
| 11581167 | Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber | David Gunther, Siew Kit Hoi | 2023-02-14 |