Issued Patents 2022
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D970566 | Sputter target for a physical vapor deposition chamber | Martin Lee Riker, William Fruchterman, Ilya Lavitsky, Srinivasa Rao YEDLA | 2022-11-22 |
| 11492697 | Apparatus for improved anode-cathode ratio for rf chambers | Keith A. Miller, Srinivasa Rao YEDLA, Chandrashekar Kenchappa, Martin Lee Riker | 2022-11-08 |
| D966357 | Target profile for a physical vapor deposition chamber target | David Gunther, Jiao Song, Madan Kumar Shimoga Mylarappa | 2022-10-11 |
| 11361982 | Methods and apparatus for in-situ cleaning of electrostatic chucks | William Johanson, David Gunther, Prashant Prabhakar Prabhu | 2022-06-14 |
| 11295938 | Multi-radius magnetron for physical vapor deposition (PVD) and methods of use thereof | Jiao Song, Anthony Chih-Tung Chan, David Gunther, Irena H. Wysok | 2022-04-05 |
| 11289312 | Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability | Adolph Miller Allen, Vanessa Faune, Zhong Qiang Hua, Anantha K. Subramani, Philip Allan Kraus +5 more | 2022-03-29 |
| 11270898 | Apparatus for enhancing flow uniformity in a process chamber | Jothilingam Ramalingam, Fuhong Zhang, William Johanson | 2022-03-08 |
| D940765 | Target profile for a physical vapor deposition chamber target | David Gunther, Jiao Song, Madan Kumar Shimoga Mylarappa | 2022-01-11 |