Issued Patents 2022
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D970566 | Sputter target for a physical vapor deposition chamber | William Fruchterman, Ilya Lavitsky, Srinivasa Rao YEDLA, Kirankumar Neelasandra SAVANDAIAH | 2022-11-22 |
| 11492697 | Apparatus for improved anode-cathode ratio for rf chambers | Kirankumar Neelasandra SAVANDAIAH, Keith A. Miller, Srinivasa Rao YEDLA, Chandrashekar Kenchappa | 2022-11-08 |
| 11492699 | Substrate temperature non-uniformity reduction over target life using spacing compensation | Suhas Bangalore Umesh, Preetham Rao, Shirish A. PETHE, Fuhong Zhang, Kishor Kalathiparambil +1 more | 2022-11-08 |
| 11335577 | Methods and apparatus to prevent interference between processing chambers | Fuhong Zhang, Sunil Kumar Garg, Paul Kiely, William Fruchterman, Zheng Wang +1 more | 2022-05-17 |
| 11315771 | Methods and apparatus for processing a substrate | Xiangjin Xie, Fuhong Zhang, Shirish A. PETHE, Lewis Yuan Tse Lo, Lanlan Zhong +2 more | 2022-04-26 |
| 11309169 | Biasable flux optimizer / collimator for PVD sputter chamber | Fuhong Zhang, Anthony Infante, Zheng Wang | 2022-04-19 |
| D946638 | Target profile for a physical vapor deposition chamber target | Fuhong Zhang, Zheng Wang | 2022-03-22 |