KT

Kandabara Tapily

TL Tokyo Electron Limited: 12 patents #5 of 787Top 1%
📍 Albany, NY: #10 of 160 inventorsTop 7%
🗺 New York: #200 of 12,766 inventorsTop 2%
Overall (2021): #5,613 of 548,734Top 2%
12
Patents 2021

Issued Patents 2021

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
11170992 Area selective deposition for cap layer formation in advanced contacts Gerrit J. Leusink 2021-11-09
11152268 Platform and method of operating for integrated end-to-end area-selective deposition process Robert D. Clark, Jason Mehigan 2021-10-19
11152207 Method of forming titanium nitride films with (200) crystallographic texture 2021-10-19
11114381 Power distribution network for 3D logic and memory Lars Liebmann, Jeffrey Smith, Anton J. deVilliers 2021-09-07
11101173 Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same Robert D. Clark, Jeffrey Smith, Angelique Raley, Qiang Zhao 2021-08-24
11031287 Fully self-aligned via with selective bilayer dielectric regrowth Jeffrey Smith 2021-06-08
11024535 Method for filling recessed features in semiconductor devices with a low-resistivity metal Kai-Hung Yu, David L. O'Meara, Nicholas Joy, Gyanaranjan Pattanaik, Robert D. Clark +3 more 2021-06-01
10991881 Method for controlling the forming voltage in resistive random access memory devices Steven P. Consiglio, Cory Wajda, Takaaki Tsunomura, Takashi Ando, Paul C. Jamison +3 more 2021-04-27
10930764 Extension region for a semiconductor device Jeffrey Smith, Nihar Mohanty, Anton J. deVilliers 2021-02-23
10923394 Platform and method of operating for integrated end-to-end fully self-aligned interconnect process Robert D. Clark, Kai-Hung Yu 2021-02-16
10916472 Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same Robert D. Clark, Jeffrey Smith, Angelique Raley, Qiang Zhao 2021-02-09
10886173 Platform and method of operating for integrated end-to-end fully self-aligned interconnect process Robert D. Clark, Kai-Hung Yu 2021-01-05