Issued Patents 2021
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11164781 | ALD (atomic layer deposition) liner for via profile control and related applications | Xinghua Sun, Yen-Tien Lu, David L. O'Meara, Jeffrey Smith | 2021-11-02 |
| 11127594 | Manufacturing methods for mandrel pull from spacers for multi-color patterning | Xinghua Sun, Andrew Metz | 2021-09-21 |
| 11101173 | Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same | Robert D. Clark, Jeffrey Smith, Kandabara Tapily, Qiang Zhao | 2021-08-24 |
| 10971372 | Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks | Subhadeep Kal, Nihar Mohanty, Aelan Mosden, Scott Lefevre | 2021-04-06 |
| 10964587 | Atomic layer deposition for low-K trench protection during etch | Yen-Tien Lu, David L. O'Meara, Xinghua Sun | 2021-03-30 |
| 10950460 | Method utilizing using post etch pattern encapsulation | Andrew Metz, Cory Wajda, Junling Sun | 2021-03-16 |
| 10916472 | Self-aware and correcting heterogenous platform incorporating integrated semiconductor processing modules and method for using same | Robert D. Clark, Jeffrey Smith, Kandabara Tapily, Qiang Zhao | 2021-02-09 |