AR

Alok Ranjan

TL Tokyo Electron Limited: 18 patents #1 of 787Top 1%
Overall (2021): #2,514 of 548,734Top 1%
18
Patents 2021

Issued Patents 2021

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
11205576 Monolayer film mediated precision material etch Peter Ventzek 2021-12-21
11205562 Hybrid electron beam and RF plasma system for controlled content of radicals and ions Zhiying Chen, Peter Ventzek 2021-12-21
11183398 Ruthenium hard mask process Zhiying Chen, Peter L. G. Ventzek 2021-11-23
11158516 Plasma processing methods using low frequency bias pulses Peter Ventzek, Mitsunori Ohata 2021-10-26
11152194 Plasma processing apparatuses having a dielectric injector Zhiying Chen, Joel Blakeney, Peter Ventzek, Kazuya Nagaseki 2021-10-19
11133194 Method for selective etching at an interface between materials Sergey Voronin, Christopher Catano, Nicholas Joy, Christopher Talone 2021-09-28
11094543 Defect correction on metal resists Yun Han, Peter Ventzek 2021-08-17
11079682 Methods for extreme ultraviolet (EUV) resist patterning development Yun Han, Peter L. G. Ventzek 2021-08-03
11056347 Method for dry etching compound materials Peter Ventzek 2021-07-06
11043362 Plasma processing apparatuses including multiple electron sources Peter Ventzek, Barton Lane, Zhiying Chen 2021-06-22
11037798 Self-limiting cyclic etch method for carbon-based films Barton Lane, Nasim Eibagi, Peter Ventzek 2021-06-15
10998170 Method for ion mass separation and ion energy control in process plasmas Yusuke Yoshida, Sergey Voronin, David J. Coumou, Scott E. White 2021-05-04
10998169 Systems and methods of control for plasma processing Peter Ventzek, Zhiying Chen 2021-05-04
10991594 Method for area-selective etching of silicon nitride layers for the manufacture of microelectronic workpieces Sonam D. Sherpa 2021-04-27
10971373 Methods for cyclic etching of a patterned layer Vinayak Rastogi 2021-04-06
10937662 Method of isotropic etching of silicon oxide utilizing fluorocarbon chemistry Sonam D. Sherpa 2021-03-02
10937664 Surface modification process Cedric Thomas, Andrew Nolan 2021-03-02
10910196 Mode-switching plasma systems and methods of operating thereof Peter Ventzek, Mitsunori Ohata, Michael Hummel 2021-02-02