Issued Patents 2021
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11193043 | System for chemical mechanical polishing of Ge-based materials and devices | Chia-Jung Hsu, Yun-Lung Ho, Neng-Kuo Chen, Song-Yuan Chang | 2021-12-07 |
| 11164956 | Capping layer for gate electrodes | Chin-Hsiang Lin, Akira Mineji, Huang-Lin Chao | 2021-11-02 |
| 11152267 | Methods of cutting metal gates and structures formed thereof | Tsu-Hsiu Perng, Kai-Chieh Yang, Zhi-Chang Lin, Wei-Hao Wu | 2021-10-19 |
| 11120995 | Method for forming multi-layer mask | Chung-Wei Hsu, Yu-Chung Su, Chen-Hao Wu, Shen-Nan Lee, Tsung-Ling Tsai | 2021-09-14 |
| 11069558 | Dummy fin structures and methods of forming same | Chin-Hsiang Lin, Keng-Chu Lin, Shwang-Ming Jeng, Tsu-Hsiu Perng, Fu-Ting Yen | 2021-07-20 |
| 11056486 | Semiconductor device with multiple threshold voltage and method of fabricating the same | Li-Ting Wang, Cheng-Tung Lin, De-Fang Chen, Hui-Cheng Chang | 2021-07-06 |
| 11031391 | Method for manufacturing a FinFET device | Shen-Nan Lee, Kuo-Yin Lin, Pin-Chuan Su | 2021-06-08 |
| 11024504 | Semiconductor structure and manufacturing method thereof | Chia-Wei Su, Fu-Ting Yen, Ting-Ting Chen | 2021-06-01 |
| 11018246 | Integrated circuit with a fin and gate structure and method making the same | Kuo-Cheng Chiang, Kuan-Lun Cheng, Chih-Hao Wang | 2021-05-25 |
| 11011385 | CMP-friendly coatings for planar recessing or removing of variable-height layers | Wen-Kuei Liu, Kuo-Yin Lin, Shen-Nan Lee, Yu-Wei Chou, Kuo-Cheng Lien +3 more | 2021-05-18 |
| 11004794 | Partial barrier free vias for cobalt-based interconnects and methods of fabrication thereof | Tsung-Ling Tsai, Shen-Nan Lee, Mrunal A. Khaderbad, Chung-Wei Hsu, Chen-Hao Wu | 2021-05-11 |
| 11004691 | Mechanism for manufacturing semiconductor device | Chen-Hao Wu, Shen-Nan Lee, Chung-Wei Hsu, Tsung-Ling Tsai | 2021-05-11 |
| 10998239 | Fin isolation structure for FinFET and method of forming the same | Chu-An Lee, Chen-Hao Wu, Peng-Chung Jangjian, Chun-Wen Hsiao, Huang-Lin Chao | 2021-05-04 |
| 10964542 | Selective high-K formation in gate-last process | Yasutoshi Okuno, Ziwei Fang, Fu-Ting Yen | 2021-03-30 |
| 10964549 | Wafer polishing with separated chemical reaction and mechanical polishing | Shen-Nan Lee, Chu-An Lee, Chen-Hao Wu, Chun-Hung Liao, Huang-Lin Chao | 2021-03-30 |
| 10920105 | Materials and methods for chemical mechanical polishing of ruthenium-containing materials | An-Hsuan Lee, Shen-Nan Lee, Chen-Hao Wu, Chun-Hung Liao, Huang-Lin Chao | 2021-02-16 |