Issued Patents 2021
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211498 | FinFETs with wrap-around silicide and method forming the same | Ching-Wei Tsai, Chi-Wen Liu, Chih-Hao Wang, Ying-Keung Leung | 2021-12-28 |
| 11211472 | Semiconductor device and method of forming the same | Pei-Hsun Wang, Shih-Cheng Chen, Chih-Hao Wang | 2021-12-28 |
| 11211381 | Semiconductor device structure and method for forming the same | Shi Ning Ju, Chih-Hao Wang, Kuan-Ting Pan, Zhi-Chang Lin | 2021-12-28 |
| 11205594 | Fin spacer protected source and drain regions in FinFETs | Ting-Hung Hsu, Chao-Hsiung Wang, Chi-Wen Liu | 2021-12-21 |
| 11205711 | Selective inner spacer implementations | Pei-Hsun Wang, Lo-Heng Chang, Jung-Hung Chang, Chih-Hao Wang | 2021-12-21 |
| 11205650 | Input/output semiconductor devices | Mao-Lin Huang, Lung-Kun Chu, Chung-Wei Hsu, Jia-Ni Yu | 2021-12-21 |
| 11201225 | Structure and formation method of semiconductor device with stressor | Shi Ning Ju, Guan-Lin Chen, Chih-Hao Wang | 2021-12-14 |
| 11164866 | Semiconductor structure and method for manufacturing the same | Shi Ning Ju, Kuan-Lun Cheng, Chih-Hao Wang, Kuan-Ting Pan, Zhi-Chang Lin | 2021-11-02 |
| 11152477 | Transistors with different threshold voltages | Lung-Kun Chu, Mao-Lin Huang, Chung-Wei Hsu, Jia-Ni Yu, Chih-Hao Wang | 2021-10-19 |
| 11145734 | Semiconductor device with dummy fin and liner and method of forming the same | Jia-Ni Yu, Lung-Kun Chu, Mao-Lin Huang, Chung-Wei Hsu, Chih-Hao Wang +1 more | 2021-10-12 |
| 11139379 | Semiconductor structure and method for forming the same | Zhi-Chang Lin, Shih-Cheng Chen, Pei-Hsun Wang, Chih-Hao Wang | 2021-10-05 |
| 11133401 | Fin structures having varied fin heights for semiconductor device | Chih-Hao Wang, Shi Ning Ju | 2021-09-28 |
| 11121213 | Fin recess last process for FinFET fabrication | Shi Ning Ju, Guan-Lin Chen | 2021-09-14 |
| 11121037 | Semiconductor device structure and method for forming the same | Ching-Wei Tsai, Yu-Xuan Huang, Kuan-Lun Cheng, Chih-Hao Wang, Min Cao +3 more | 2021-09-14 |
| 11114550 | Recessing STI to increase FIN height in FIN-first process | Guan-Lin Chen | 2021-09-07 |
| 11114529 | Gate-all-around field-effect transistor device | Huan-Chieh Su, Shi Ning Ju, Kuan-Ting Pan, Chih-Hao Wang | 2021-09-07 |
| 11087988 | Semiconductor device structure with silicide and method for forming the same | Chun-Hsiung Lin, Jung-Hung Chang, Shih-Cheng Chen, Chih-Hao Wang | 2021-08-10 |
| 11075201 | Tuning tensile strain on FinFET | Zhi-Chang Lin, Guan-Lin Chen, Ting-Hung Hsu, Jiun-Jia Huang | 2021-07-27 |
| 11038061 | Semiconductor device structure and method for forming the same | Shi Ning Ju, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2021-06-15 |
| 11038058 | Semiconductor device structure and method for forming the same | Shi Ning Ju, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2021-06-15 |
| 11031292 | Multi-gate device and related methods | Shi Ning Ju, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2021-06-08 |
| 11018246 | Integrated circuit with a fin and gate structure and method making the same | Teng-Chun Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2021-05-25 |
| 11011625 | Liner for a bi-layer gate helmet and the fabrication thereof | Huan-Chieh Su, Chih-Hao Wang, Wei-Hao Wu, Zhi-Chang Lin, Jia-Ni Yu +2 more | 2021-05-18 |
| 10998425 | FinFET structure and method for fabricating the same | Guan-Lin Chen, Chao-Hsiung Wang, Chi-Wen Liu | 2021-05-04 |
| 10985072 | Etch profile control of polysilicon structures of semiconductor devices | Chih-Hao Wang, Kuan-Ting Pan | 2021-04-20 |