Issued Patents 2021
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11201225 | Structure and formation method of semiconductor device with stressor | Kuo-Cheng Chiang, Shi Ning Ju, Chih-Hao Wang | 2021-12-14 |
| 11121036 | Multi-gate device and related methods | Kuo-Cheng Ching, Huan-Chieh Su, Shi Ning Ju, Chih-Hao Wang | 2021-09-14 |
| 11121213 | Fin recess last process for FinFET fabrication | Kuo-Cheng Chiang, Shi Ning Ju | 2021-09-14 |
| 11114550 | Recessing STI to increase FIN height in FIN-first process | Kuo-Cheng Chiang | 2021-09-07 |
| 11075201 | Tuning tensile strain on FinFET | Kuo-Cheng Chiang, Zhi-Chang Lin, Ting-Hung Hsu, Jiun-Jia Huang | 2021-07-27 |
| 10998425 | FinFET structure and method for fabricating the same | Kuo-Cheng Chiang, Chao-Hsiung Wang, Chi-Wen Liu | 2021-05-04 |
| 10930794 | Self-aligned spacers for multi-gate devices and method of fabrication thereof | Kuo-Cheng Ching, Shi Ning Ju, Kuan-Lun Cheng, Chih-Hao Wang | 2021-02-23 |