Issued Patents 2021
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211293 | FinFET device and methods of forming the same | Chih-Hao Wang, Wei-Hao Wu, Zhi-Chang Lin, Jia-Ni Yu, Chung-Wei Hsu | 2021-12-28 |
| 11195930 | Semiconductor devices with backside power rail and methods of fabrication thereof | Chun-Yuan Chen, Pei-Yu Wang, Chih-Hao Wang | 2021-12-07 |
| 11171053 | Transistor device and related methods | Kuo-Cheng Ching, Lin-Yu Huang, Sheng-Tsung Wang, Zhi-Chang Lin, Jia-Chuan You +4 more | 2021-11-09 |
| 11158512 | Fin field effect transistor (FinFET) device structure | Jia-Ni Yu, Zhi-Chang Lin, Wei-Hao Wu, Chung-Wei Hsu, Chih-Hao Wang | 2021-10-26 |
| 11152487 | Method for manufacturing semiconductor device | Zhi-Chang Lin, Ting-Hung Hsu, Jia-Ni Yu, Wei-Hao Wu, Chih-Hao Wang | 2021-10-19 |
| 11121036 | Multi-gate device and related methods | Kuo-Cheng Ching, Shi Ning Ju, Guan-Lin Chen, Chih-Hao Wang | 2021-09-14 |
| 11114529 | Gate-all-around field-effect transistor device | Kuo-Cheng Chiang, Shi Ning Ju, Kuan-Ting Pan, Chih-Hao Wang | 2021-09-07 |
| 11011625 | Liner for a bi-layer gate helmet and the fabrication thereof | Chih-Hao Wang, Kuo-Cheng Chiang, Wei-Hao Wu, Zhi-Chang Lin, Jia-Ni Yu +2 more | 2021-05-18 |
| 10950713 | Method and device for forming cut-metal-gate feature | Zhi-Chang Lin, Wei-Hao Wu, Jia-Ni Yu, Ting-Hung Hsu, Chih-Hao Wang | 2021-03-16 |
| 10930763 | Method and device for forming metal gate electrodes for transistors | Zhi-Chang Lin, Ting-Hung Hsu, Jia-Ni Yu, Wei-Hao Wu, Yu-Ming Lin +1 more | 2021-02-23 |