Issued Patents 2021
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211472 | Semiconductor device and method of forming the same | Shih-Cheng Chen, Kuo-Cheng Chiang, Chih-Hao Wang | 2021-12-28 |
| 11205711 | Selective inner spacer implementations | Kuo-Cheng Chiang, Lo-Heng Chang, Jung-Hung Chang, Chih-Hao Wang | 2021-12-21 |
| 11158727 | Structure and method for gate-all-around device with extended channel | Chih-Chao Chou, Chun-Hsiung Lin, Ching-Wei Tsai, Chih-Hao Wang | 2021-10-26 |
| 11139379 | Semiconductor structure and method for forming the same | Zhi-Chang Lin, Shih-Cheng Chen, Kuo-Cheng Chiang, Chih-Hao Wang | 2021-10-05 |
| 11121037 | Semiconductor device structure and method for forming the same | Ching-Wei Tsai, Yu-Xuan Huang, Kuan-Lun Cheng, Chih-Hao Wang, Min Cao +3 more | 2021-09-14 |
| 11049774 | Hybrid source drain regions formed based on same Fin and methods forming same | Shih-Cheng Chen, Chun-Hsiung Lin, Chih-Hao Wang | 2021-06-29 |
| 10944009 | Methods of fabricating a FinFET device with wrap-around silicide source/drain structure | Chih-Chao Chou, Shih-Cheng Chen, Jung-Hung Chang, Jui-Chien Huang, Chun-Hsiung Lin +1 more | 2021-03-09 |
| 10923598 | Gate-all-around structure and methods of forming the same | Chun-Hsiung Lin, Chih-Hao Wang | 2021-02-16 |