Issued Patents 2021
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11183574 | Work function layers for transistor gate electrodes | Chung-Liang Cheng, Ziwei Fang, Chun-I Wu | 2021-11-23 |
| 11177259 | Multi-threshold gate structure with doped gate dielectric layer | Chung-Liang Cheng, I-Ming Chang, Ziwei Fang | 2021-11-16 |
| 11164956 | Capping layer for gate electrodes | Chin-Hsiang Lin, Teng-Chun Tsai, Akira Mineji | 2021-11-02 |
| 11139397 | Self-aligned metal compound layers for semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang, Chi On Chui | 2021-10-05 |
| 11069807 | Ferroelectric structure for semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang, Bo-Feng Young, Chi On Chui +1 more | 2021-07-20 |
| 11049937 | Gate structures for semiconductor devices | Chung-Liang Cheng, Chun-I Wu | 2021-06-29 |
| 11038029 | Semiconductor device structure and method for forming the same | Hsueh Wen Tsau, Chun-I Wu, Ziwei Fang, I-Ming Chang, Chung-Liang Cheng +1 more | 2021-06-15 |
| 11031291 | Semiconductor structure and method of forming the same | I-Ming Chang, Chung-Liang Cheng, Hsiang-Pi Chang, Hung-Chang Sun, Yao-Sheng Huang +3 more | 2021-06-08 |
| 11031490 | Fabrication of field effect transistors with ferroelectric materials | Cheng-Ming Lin, Sai-Hooi Yeong, Chi On Chui, Ziwei Fang | 2021-06-08 |
| 11018256 | Selective internal gate structure for ferroelectric semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang, Chi On Chui | 2021-05-25 |
| 11018022 | Method for forming semiconductor device structure having oxide layer | I-Ming Chang, Chih-Cheng Lin, Chi-Ying Wu, Wei-Ming You, Ziwei Fang | 2021-05-25 |
| 10998239 | Fin isolation structure for FinFET and method of forming the same | Chu-An Lee, Chen-Hao Wu, Peng-Chung Jangjian, Chun-Wen Hsiao, Teng-Chun Tsai | 2021-05-04 |
| 10985265 | Method for forming semiconductor device structure | Chung-Liang Cheng, I-Ming Chang, Hsiang-Pi Chang, Hsueh Wen Tsau, Ziwei Fang | 2021-04-20 |
| 10985022 | Gate structures having interfacial layers | Chung-Liang Cheng, Chun-I Wu, Ziwei Fang | 2021-04-20 |
| 10978567 | Gate stack treatment for ferroelectric transistors | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang, Chi On Chui | 2021-04-13 |
| 10971402 | Semiconductor device including interface layer and method of fabricating thereof | Chung-Liang Cheng, I-Ming Chang, Hsiang-Pi Chang, Yu-Wei Lu, Ziwei Fang | 2021-04-06 |
| 10964549 | Wafer polishing with separated chemical reaction and mechanical polishing | Shen-Nan Lee, Teng-Chun Tsai, Chu-An Lee, Chen-Hao Wu, Chun-Hung Liao | 2021-03-30 |
| 10920105 | Materials and methods for chemical mechanical polishing of ruthenium-containing materials | An-Hsuan Lee, Shen-Nan Lee, Chen-Hao Wu, Chun-Hung Liao, Teng-Chun Tsai | 2021-02-16 |