Issued Patents 2021
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11205724 | Self-aligned gate hard mask and method forming same | Kai-Hsuan Lee, Bo-Yu Lai, Sheng-Chen Wang, Sai-Hooi Yeong, Yen-Ming Chen | 2021-12-21 |
| 11195938 | Device performance by fluorine treatment | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang | 2021-12-07 |
| 11189708 | Semiconductor device structure with gate stack and method for forming the same | Sai-Hooi Yeong, Chien Ning Yao | 2021-11-30 |
| 11183504 | Structures for testing nanoscale devices including ferroelectric capacitors and methods for forming the same | Chenchen Jacob Wang, Yu-Ming Lin, Sai-Hooi Yeong, Bo-Feng Young | 2021-11-23 |
| 11171219 | Negative-capacitance and ferroelectric field-effect transistor (NCFET and FE-FET) devices | Te-Yang Lai, Bo-Feng Young, Chun-Yen Peng, Sai-Hooi Yeong, Chih-Yu Chang | 2021-11-09 |
| 11162060 | Self-locking optoelectronic tweezer and its fabrication | Yajia Yang, Yufei Mao, Pei-Yu E. Chiou | 2021-11-02 |
| 11164868 | Semiconductor device | Hsin-Yi Lee, Cheng-Lung Hung, Weng Chang | 2021-11-02 |
| 11152508 | Semiconductor device including two-dimensional material layer | Sai-Hooi Yeong, Syun-Ming Jang, Min Cao | 2021-10-19 |
| 11145746 | Semiconductor device and method | Wen-Ju Chen, Chung-Ting Ko | 2021-10-12 |
| 11139397 | Self-aligned metal compound layers for semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang, Huang-Lin Chao | 2021-10-05 |
| 11133229 | Forming transistor by selectively growing gate spacer | Kai-Hsuan Lee, Chia-Ta Yu, Cheng-Yu Yang, Sheng-Chen Wang, Bo-Yu Lai +4 more | 2021-09-28 |
| 11107897 | Methods of forming semiconductor devices and FinFET devices having shielding layers | Che-Hao Chang, Cheng-Hao Hou, Kuei-Lun Lin, Kun-Yu Lee, Xiong-Fei Yu | 2021-08-31 |
| 11101180 | Semiconductor device and method of manufacture | Chun-Yen Peng, Te-Yang Lai, Sai-Hooi Yeong | 2021-08-24 |
| 11088154 | Ferroelectric device and methods of fabrication thereof | Sai-Hooi Yeong | 2021-08-10 |
| 11081395 | Fin field effect transistor having air gap and method for manufacturing the same | Sai-Hooi Yeong, Kai-Hsuan Lee, Yu-Ming Lin | 2021-08-03 |
| 11069807 | Ferroelectric structure for semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang, Bo-Feng Young, Chih-Yu Chang +1 more | 2021-07-20 |
| 11069531 | Replacement gate methods that include treating spacers to widen gate | Shu-Han Chen, Tsung-Ju Chen, Ta-Hsiang Kung, Xiong-Fei Yu | 2021-07-20 |
| 11043570 | Semiconductor device and manufacturing method thereof | Yee-Chia Yeo, Sung-Li Wang, Jyh-Cherng Sheu, Hung-Li Chiang, I-Sheng Chen | 2021-06-22 |
| 11031490 | Fabrication of field effect transistors with ferroelectric materials | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang, Huang-Lin Chao | 2021-06-08 |
| 11018256 | Selective internal gate structure for ferroelectric semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang, Huang-Lin Chao | 2021-05-25 |
| 11011372 | Semiconductor devices and methods of manufacture | Chun-Yen Peng, Te-Yang Lai, Sai-Hooi Yeong | 2021-05-18 |
| 10985266 | Method of gap filling for semiconductor device | Te-Yang Lai, Che-Hao Chang | 2021-04-20 |
| 10978567 | Gate stack treatment for ferroelectric transistors | Cheng-Ming Lin, Sai-Hooi Yeong, Ziwei Fang, Huang-Lin Chao | 2021-04-13 |
| 10971627 | Semiconductor structure and manufacturing method | Sai-Hooi Yeong, Yu-Ming Lin, Chih-Hao Wang | 2021-04-06 |
| 10943818 | Semiconductor device and method | Chun-Han Chen, I-Wen Wu, Chen-Ming Lee, Fu-Kai Yang, Mei-Yun Wang +2 more | 2021-03-09 |