Issued Patents 2021
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211244 | Ultraviolet radiation activated atomic layer deposition | Christine Y Ouyang | 2021-12-28 |
| 11201060 | Structure and formation method of semiconductor device with metal gate stack | Christine Y Ouyang | 2021-12-14 |
| 11195938 | Device performance by fluorine treatment | Cheng-Ming Lin, Sai-Hooi Yeong, Chi On Chui | 2021-12-07 |
| 11195931 | Gate structure, semiconductor device and the method of forming semiconductor device | Chun Hsiung Tsai, Kuo-Feng Yu, Chien-Tai Chan, Kei-Wei Chen, Huai-Tei Yang | 2021-12-07 |
| 11183574 | Work function layers for transistor gate electrodes | Chung-Liang Cheng, Chun-I Wu, Huang-Lin Chao | 2021-11-23 |
| 11177259 | Multi-threshold gate structure with doped gate dielectric layer | Chung-Liang Cheng, I-Ming Chang, Huang-Lin Chao | 2021-11-16 |
| 11164796 | Method for forming semiconductor device structure | Chung-Liang Cheng | 2021-11-02 |
| 11139397 | Self-aligned metal compound layers for semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Chi On Chui, Huang-Lin Chao | 2021-10-05 |
| 11127832 | Semiconductor structure and method for forming the same | Chung-Liang Cheng | 2021-09-21 |
| 11088034 | Gate structures for semiconductor devices | Chung-Liang Cheng | 2021-08-10 |
| 11069807 | Ferroelectric structure for semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Bo-Feng Young, Chi On Chui, Chih-Yu Chang +1 more | 2021-07-20 |
| 11038029 | Semiconductor device structure and method for forming the same | Hsueh Wen Tsau, Chun-I Wu, Huang-Lin Chao, I-Ming Chang, Chung-Liang Cheng +1 more | 2021-06-15 |
| 11031490 | Fabrication of field effect transistors with ferroelectric materials | Cheng-Ming Lin, Sai-Hooi Yeong, Chi On Chui, Huang-Lin Chao | 2021-06-08 |
| 11031291 | Semiconductor structure and method of forming the same | I-Ming Chang, Chung-Liang Cheng, Hsiang-Pi Chang, Hung-Chang Sun, Yao-Sheng Huang +3 more | 2021-06-08 |
| 11018256 | Selective internal gate structure for ferroelectric semiconductor devices | Cheng-Ming Lin, Sai-Hooi Yeong, Chi On Chui, Huang-Lin Chao | 2021-05-25 |
| 11018022 | Method for forming semiconductor device structure having oxide layer | I-Ming Chang, Chih-Cheng Lin, Chi-Ying Wu, Wei-Ming You, Huang-Lin Chao | 2021-05-25 |
| 11007005 | Method of manufacturing a semiconductor device and a semiconductor device | Tung Ying Lee, Yee-Chia Yeo, Meng-Hsuan Hsiao | 2021-05-18 |
| 10985022 | Gate structures having interfacial layers | Chung-Liang Cheng, Chun-I Wu, Huang-Lin Chao | 2021-04-20 |
| 10985265 | Method for forming semiconductor device structure | Chung-Liang Cheng, I-Ming Chang, Hsiang-Pi Chang, Hsueh Wen Tsau, Huang-Lin Chao | 2021-04-20 |
| 10978357 | Semiconductor arrangement and method of manufacture | I-Ming Chang, Chung-Liang Cheng, Hsiang-Pi Chang, Hsueh Wen Tsau | 2021-04-13 |
| 10978567 | Gate stack treatment for ferroelectric transistors | Cheng-Ming Lin, Sai-Hooi Yeong, Chi On Chui, Huang-Lin Chao | 2021-04-13 |
| 10971402 | Semiconductor device including interface layer and method of fabricating thereof | Chung-Liang Cheng, I-Ming Chang, Hsiang-Pi Chang, Yu-Wei Lu, Huang-Lin Chao | 2021-04-06 |
| 10964542 | Selective high-K formation in gate-last process | Yasutoshi Okuno, Teng-Chun Tsai, Fu-Ting Yen | 2021-03-30 |
| 10964792 | Dual metal capped via contact structures for semiconductor devices | Chung-Liang Cheng | 2021-03-30 |
| 10923393 | Contacts and interconnect structures in field-effect transistors | Chung-Liang Cheng | 2021-02-16 |