Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211455 | Formation of dislocations in source and drain regions of FinFET devices | Chun Hsiung Tsai, Wei-Yuan Lu, Wei-Yang Lee, Da-Wen Lin | 2021-12-28 |
| 11195931 | Gate structure, semiconductor device and the method of forming semiconductor device | Chun Hsiung Tsai, Kuo-Feng Yu, Ziwei Fang, Kei-Wei Chen, Huai-Tei Yang | 2021-12-07 |