| 11043380 |
Techniques to engineer nanoscale patterned features using ions |
Simon Ruffell, John Hautala, Adam Brand |
2021-06-22 |
| 10990014 |
Performance improvement of EUV photoresist by ion implantation |
Tristan Y. Ma, Anthony Renau, John Hautala, Joseph C. Olson |
2021-04-27 |
| 10957590 |
Method for forming a layer |
Wenhui Wang, Christopher S. Ngai, Liqi Wu, Wenyu Zhang, Yongmei Chen +3 more |
2021-03-23 |
| 10927450 |
Methods and apparatus for patterning substrates using asymmetric physical vapor deposition |
Bencherki Mebarki, Wenhui Wang, Christopher S. Ngai, Joung Joo Lee, Xianmin Tang |
2021-02-23 |
| 10930556 |
Contact over active gate structure |
Wenhui Wang, Christopher S. Ngai |
2021-02-23 |
| 10927451 |
Methods and apparatus for patterning substrates using asymmetric physical vapor deposition |
Bencherki Mebarki, Byeong-Chan Lee, Tejinder Singh, Joung Joo Lee, Xianmin Tang |
2021-02-23 |
| 10930555 |
Contact over active gate structure |
Wenhui Wang, Christopher S. Ngai |
2021-02-23 |
