| 11195712 |
Process for deposition of titanium oxynitride for use in integrated circuit fabrication |
Seiji Okura, Hidemi Suemori |
2021-12-07 |
| 11170993 |
Selective PEALD of oxide on dielectric |
Eva Tois, Suvi Haukka, Toshiya Suzuki, Lingyun Jia, Sun Ja Kim +1 more |
2021-11-09 |
| 11158500 |
Plasma enhanced deposition processes for controlled formation of oxygen containing thin films |
Lingyun Jia, Marko Tuominen, Sun Ja Kim, Oreste Madia |
2021-10-26 |
| 11133181 |
Formation of SiN thin films |
Toshiya Suzuki, Shang Chen, Ryoko Yamada, Dai Ishikawa, Kunitoshi Namba |
2021-09-28 |
| 11107673 |
Formation of SiOCN thin films |
Toshiya Suzuki |
2021-08-31 |
| 11107676 |
Method and apparatus for filling a gap |
Werner Knaepen, Bert Jongbloed, Dieter Pierreux, Gido Van Der Star, Toshiya Suzuki |
2021-08-31 |
| 11072622 |
Synthesis and use of precursors for ALD of tellurium and selenium thin films |
Timo Hatanpää, Mikko Ritala, Markku Leskelä |
2021-07-27 |
| 11069522 |
Si precursors for deposition of SiN at low temperatures |
Antti Niskanen, Shang Chen, Atsuki Fukazawa, Hideaki Fukuda, Suvi Haukka |
2021-07-20 |
| 11047040 |
Dual selective deposition |
Suvi Haukka, Raija H. Matero, Eva Tois, Antti Niskanen, Marko Tuominen +1 more |
2021-06-29 |
| 10991573 |
Uniform deposition of SiOC on dielectric and metal surfaces |
Lingyun Jia, Eva Tois, Sun Ja Kim |
2021-04-27 |
| 10941487 |
Synthesis and use of precursors for ALD of group VA element containing thin films |
Timo Hatanpää, Mikko Ritala, Markku Leskelä |
2021-03-09 |
| 10923361 |
Deposition of organic films |
Eva Tois, Hidemi Suemori, Suvi Haukka, Varun Sharma, Jan Willem Maes +2 more |
2021-02-16 |