Issued Patents 2021
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11195718 | Spacer open process by dual plasma | Tsai Wen Sung, Chun Yan, Michael X. Yang, Dixit V. Desai, Peter J. Lembesis | 2021-12-07 |
| 11183397 | Selective etch process using hydrofluoric acid and ozone gases | Qi Zhang, Haichun Yang, Ting Xie, Michael X. Yang | 2021-11-23 |
| 11164725 | Generation of hydrogen reactive species for processing of workpieces | Qi Zhang, Xinliang Lu, Michael X. Yang | 2021-11-02 |
| 11164767 | Integrated system for semiconductor process | Xinyu BAO, Schubert S. Chu | 2021-11-02 |
| 11164742 | Selective deposition using methylation treatment | Michael X. Yang, Xinliang Lu | 2021-11-02 |
| 11164727 | Processing of workpieces using hydrogen radicals and ozone gas | Ting Xie, Bin Dong, Xinliang Lu, Haichun Yang, Michael X. Yang | 2021-11-02 |
| 11124874 | Methods for depositing metallic iridium and iridium silicide | Feng Q. Liu, Schubert S. Chu | 2021-09-21 |
| 11107695 | Surface smoothing of workpieces | Qi Zhang, Xinliang Lu | 2021-08-31 |
| 11062910 | Surface treatment of silicon or silicon germanium surfaces using organic radicals | Michael X. Yang, Xinliang Lu | 2021-07-13 |
| 11043393 | Ozone treatment for selective silicon nitride etch over silicon | Shanyu Wang, Ting Xie, Chun Yan, Xinliang Lu, Michael X. Yang | 2021-06-22 |
| 11039527 | Air leak detection in plasma processing apparatus with separation grid | Shuang Meng, Xinliang Lu, Shawming Ma | 2021-06-15 |
| 11018003 | Method of selective silicon germanium epitaxy at low temperatures | Yi-Chiau Huang | 2021-05-25 |
| 11011635 | Method of forming conformal epitaxial semiconductor cladding material over a fin field effect transistor (FINFET) device | Sheng-Chin Kung | 2021-05-18 |
| 10964528 | Integration of materials removal and surface treatment in semiconductor device fabrication | Michael X. Yang, Xinliang Lu, Haochen Li, Ting Xie, Qi Zhang | 2021-03-30 |
| 10950416 | Chamber seasoning to improve etch uniformity by reducing chemistry | Qi Zhang, Xinliang Lu | 2021-03-16 |
| 10950428 | Method for processing a workpiece | Ting Xie, Xinliang Lu, Shawming Ma, Michael X. Yang | 2021-03-16 |
| 10910228 | Surface treatment of carbon containing films using organic radicals | Michael X. Yang, Xinliang Lu | 2021-02-02 |