| 11195718 |
Spacer open process by dual plasma |
Tsai Wen Sung, Chun Yan, Michael X. Yang, Dixit V. Desai, Peter J. Lembesis |
2021-12-07 |
| 11183397 |
Selective etch process using hydrofluoric acid and ozone gases |
Qi Zhang, Haichun Yang, Ting Xie, Michael X. Yang |
2021-11-23 |
| 11164725 |
Generation of hydrogen reactive species for processing of workpieces |
Qi Zhang, Xinliang Lu, Michael X. Yang |
2021-11-02 |
| 11164767 |
Integrated system for semiconductor process |
Xinyu BAO, Schubert S. Chu |
2021-11-02 |
| 11164742 |
Selective deposition using methylation treatment |
Michael X. Yang, Xinliang Lu |
2021-11-02 |
| 11164727 |
Processing of workpieces using hydrogen radicals and ozone gas |
Ting Xie, Bin Dong, Xinliang Lu, Haichun Yang, Michael X. Yang |
2021-11-02 |
| 11124874 |
Methods for depositing metallic iridium and iridium silicide |
Feng Q. Liu, Schubert S. Chu |
2021-09-21 |
| 11107695 |
Surface smoothing of workpieces |
Qi Zhang, Xinliang Lu |
2021-08-31 |
| 11062910 |
Surface treatment of silicon or silicon germanium surfaces using organic radicals |
Michael X. Yang, Xinliang Lu |
2021-07-13 |
| 11043393 |
Ozone treatment for selective silicon nitride etch over silicon |
Shanyu Wang, Ting Xie, Chun Yan, Xinliang Lu, Michael X. Yang |
2021-06-22 |
| 11039527 |
Air leak detection in plasma processing apparatus with separation grid |
Shuang Meng, Xinliang Lu, Shawming Ma |
2021-06-15 |
| 11018003 |
Method of selective silicon germanium epitaxy at low temperatures |
Yi-Chiau Huang |
2021-05-25 |
| 11011635 |
Method of forming conformal epitaxial semiconductor cladding material over a fin field effect transistor (FINFET) device |
Sheng-Chin Kung |
2021-05-18 |
| 10964528 |
Integration of materials removal and surface treatment in semiconductor device fabrication |
Michael X. Yang, Xinliang Lu, Haochen Li, Ting Xie, Qi Zhang |
2021-03-30 |
| 10950416 |
Chamber seasoning to improve etch uniformity by reducing chemistry |
Qi Zhang, Xinliang Lu |
2021-03-16 |
| 10950428 |
Method for processing a workpiece |
Ting Xie, Xinliang Lu, Shawming Ma, Michael X. Yang |
2021-03-16 |
| 10910228 |
Surface treatment of carbon containing films using organic radicals |
Michael X. Yang, Xinliang Lu |
2021-02-02 |
