Issued Patents 2021
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11164742 | Selective deposition using methylation treatment | Michael X. Yang, Hua Chung | 2021-11-02 |
| 11164727 | Processing of workpieces using hydrogen radicals and ozone gas | Ting Xie, Hua Chung, Bin Dong, Haichun Yang, Michael X. Yang | 2021-11-02 |
| 11164725 | Generation of hydrogen reactive species for processing of workpieces | Qi Zhang, Hua Chung, Michael X. Yang | 2021-11-02 |
| 11107695 | Surface smoothing of workpieces | Qi Zhang, Hua Chung | 2021-08-31 |
| 11062910 | Surface treatment of silicon or silicon germanium surfaces using organic radicals | Michael X. Yang, Hua Chung | 2021-07-13 |
| 11043393 | Ozone treatment for selective silicon nitride etch over silicon | Shanyu Wang, Ting Xie, Chun Yan, Hua Chung, Michael X. Yang | 2021-06-22 |
| 11039527 | Air leak detection in plasma processing apparatus with separation grid | Shuang Meng, Shawming Ma, Hua Chung | 2021-06-15 |
| 10964528 | Integration of materials removal and surface treatment in semiconductor device fabrication | Michael X. Yang, Hua Chung, Haochen Li, Ting Xie, Qi Zhang | 2021-03-30 |
| 10950428 | Method for processing a workpiece | Ting Xie, Hua Chung, Shawming Ma, Michael X. Yang | 2021-03-16 |
| 10950416 | Chamber seasoning to improve etch uniformity by reducing chemistry | Qi Zhang, Hua Chung | 2021-03-16 |
| 10910228 | Surface treatment of carbon containing films using organic radicals | Michael X. Yang, Hua Chung | 2021-02-02 |