Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11183397 | Selective etch process using hydrofluoric acid and ozone gases | Qi Zhang, Hua Chung, Ting Xie, Michael X. Yang | 2021-11-23 |
| 11164727 | Processing of workpieces using hydrogen radicals and ozone gas | Ting Xie, Hua Chung, Bin Dong, Xinliang Lu, Michael X. Yang | 2021-11-02 |