| 11183397 |
Selective etch process using hydrofluoric acid and ozone gases |
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| 11164725 |
Generation of hydrogen reactive species for processing of workpieces |
Xinliang Lu, Hua Chung, Michael X. Yang |
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| 11108977 |
Dual wavelength eye imaging |
Robin Sharma, Andrew John Ouderkirk, Christopher Yuan Ting Liao, Karol Constantine Hatzilias |
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| 11107695 |
Surface smoothing of workpieces |
Xinliang Lu, Hua Chung |
2021-08-31 |
| 11092874 |
Phase-shift matched Fresnel layers |
Robin Sharma, Andrew John Ouderkirk |
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| 11036291 |
Polarization-stabilized beam-shaping illuminator |
Joseph S. Corry, Alexander Randon Cope, Maik Andre Scheller |
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| 10983384 |
Polarizer and display device |
Shibiao Zeng, Xiaodong Han, Jianhe Li |
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| 10964528 |
Integration of materials removal and surface treatment in semiconductor device fabrication |
Michael X. Yang, Hua Chung, Xinliang Lu, Haochen Li, Ting Xie |
2021-03-30 |
| 10950416 |
Chamber seasoning to improve etch uniformity by reducing chemistry |
Xinliang Lu, Hua Chung |
2021-03-16 |
| 10948729 |
Keep-out zone for in-field light sources of a head mounted display |
Karol Constantine Hatzilias, Robin Sharma, Andrew John Ouderkirk, Christopher Yuan Ting Liao |
2021-03-16 |
| 10916569 |
Thin-film transistor and method of forming an electrode of a thin-film transistor |
Shuwei Sun, Francois-Charles Dary, Marc Abouaf, Patrick Hogan |
2021-02-09 |
| 10884241 |
Optical element for reducing stray infrared light |
Karol Constantine Hatzilias, Robin Sharma, Gregory Olegovic Andreev, Christopher Yuan Ting Liao, Andrew John Ouderkirk |
2021-01-05 |
