Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11195718 | Spacer open process by dual plasma | Tsai Wen Sung, Hua Chung, Michael X. Yang, Dixit V. Desai, Peter J. Lembesis | 2021-12-07 |
| 11043393 | Ozone treatment for selective silicon nitride etch over silicon | Shanyu Wang, Ting Xie, Xinliang Lu, Hua Chung, Michael X. Yang | 2021-06-22 |