Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10788748 | Method and appliance for predicting the imaging result obtained with a mask when a lithography process is carried out | Holger Seitz, Ute Buttgereit, Thomas Trautzsch, Mame Kouna Top-Diallo, Christoph Husemann | 2020-09-29 |
| 10698318 | Method and device for characterizing a mask for microlithography | Holger Seitz, Ute Buttgereit, Thomas Frank, Ulrich Matejka, Markus Deguenther +2 more | 2020-06-30 |
| 10578975 | Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography | Joachim Welte, Kujan Gorhad, Vladimir Dmitriev, Ute Buttgereit, Thomas Scheruebl +1 more | 2020-03-03 |
| 10539865 | Method and device for determining an OPC model | Holger Seitz, Ute Buttgereit, Thomas Trautzsch | 2020-01-21 |