Issued Patents 2020
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10578975 | Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography | Thomas Thaler, Joachim Welte, Kujan Gorhad, Ute Buttgereit, Thomas Scheruebl +1 more | 2020-03-03 |