Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10578975 | Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography | Thomas Thaler, Joachim Welte, Kujan Gorhad, Vladimir Dmitriev, Ute Buttgereit +1 more | 2020-03-03 |
| 10572990 | Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system | Shusuke Yoshitake, Manabu Isobe, Dirk Beyer, Sven Heisig | 2020-02-25 |