Issued Patents 2020
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10586323 | Reference-image confirmation method, mask inspection method, and mask inspection device | Eiji Matsumoto | 2020-03-10 |
| 10572990 | Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system | Shusuke Yoshitake, Thomas Scheruebl, Dirk Beyer, Sven Heisig | 2020-02-25 |