Issued Patents 2020
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10788761 | Determining an optimal operational parameter setting of a metrology system | Leon Paul VAN DIJK, Victor Emanuel Calado, Xing Lan Liu | 2020-09-29 |
| 10718604 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2020-07-21 |
| 10719011 | Method and apparatus to correct for patterning process error | Peter Ten Berge, Daan Maurits Slotboom, Peter Hanzen Wardenier | 2020-07-21 |
| 10691863 | Method and apparatus to correct for patterning process error | Peter Ten Berge, Everhardus Cornelis Mos, Peter Hanzen Wardenier, Erik Weber Jensen | 2020-06-23 |
| 10642162 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2020-05-05 |
| 10545410 | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product | Hakki Ergün Cekli, Masashi Ishibashi, Leon Paul VAN DIJK, Xing Lan Liu, Reiner Maria Jungblut +2 more | 2020-01-28 |