Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10788761 | Determining an optimal operational parameter setting of a metrology system | Leon Paul VAN DIJK, Victor Emanuel Calado, Richard Johannes Franciscus Van Haren | 2020-09-29 |
| 10718604 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2020-07-21 |
| 10545410 | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product | Hakki Ergün Cekli, Masashi Ishibashi, Leon Paul VAN DIJK, Richard Johannes Franciscus Van Haren, Reiner Maria Jungblut +2 more | 2020-01-28 |