Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10788761 | Determining an optimal operational parameter setting of a metrology system | Victor Emanuel Calado, Xing Lan Liu, Richard Johannes Franciscus Van Haren | 2020-09-29 |
| 10545410 | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product | Hakki Ergün Cekli, Masashi Ishibashi, Richard Johannes Franciscus Van Haren, Xing Lan Liu, Reiner Maria Jungblut +2 more | 2020-01-28 |