Issued Patents 2019
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10524345 | Residual gain monitoring and reduction for EUV drive laser | Chun-Lin Chang, Jen-Hao Yeh, Han-Lung Chang, Tzung-Chi Fu, Li-Jui Chen +1 more | 2019-12-31 |
| 10509324 | Light source for lithography exposure process | Hsin-Feng Chen, Han-Lung Chang, Li-Jui Chen | 2019-12-17 |
| 10506698 | EUV source generation method and related system | Chun-Lin Chang, Tzung-Chi Fu, Li-Jui Chen, Po-Chung Cheng, Wei YI +1 more | 2019-12-10 |
| 10495987 | Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system | Chi-Ming Yang, Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Tzung-Chi Fu +2 more | 2019-12-03 |
| 10477663 | Light source for lithography exposure process | Chieh Hsieh, Shang-Chieh Chien, Chun-Chia Hsu, Tzung-Chi Fu, Li-Jui Chen +1 more | 2019-11-12 |
| 10429729 | EUV radiation modification methods and systems | Chun-Lin Chang, Jen-Hao Yeh, Tzung-Chi Fu, Li-Jui Chen, Po-Chung Cheng | 2019-10-01 |
| 10429314 | EUV vessel inspection method and related system | Chun-Lin Chang, Shang-Chieh Chien, Shang-Ying WU, Li-Kai Cheng, Tzung-Chi Fu +4 more | 2019-10-01 |
| 10361134 | Method for lithographic process and lithographic system | Wei-Chih Lai, Li-Kai Cheng, Shun-Jung Chen, Han-Lung Chang, Tzung-Chi Fu +1 more | 2019-07-23 |
| 10342109 | Apparatus and method for generating extreme ultraviolet radiation | Wei-Chih Lai, Han-Lung Chang, Li-Jui Chen, Po-Chung Cheng | 2019-07-02 |
| 10338475 | Light source for lithography exposure process | Hsin-Feng Chen, Han-Lung Chang, Li-Jui Chen | 2019-07-02 |
| 10314154 | System and method for extreme ultraviolet source control | Chun-Chia Hsu, Chieh Hsieh, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng +1 more | 2019-06-04 |