Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10495987 | Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system | Chi-Ming Yang, Ssu-Yu Chen, Shang-Chieh Chien, Tzung-Chi Fu, Bo-Tsun Liu +2 more | 2019-12-03 |
| 10477663 | Light source for lithography exposure process | Shang-Chieh Chien, Chun-Chia Hsu, Bo-Tsun Liu, Tzung-Chi Fu, Li-Jui Chen +1 more | 2019-11-12 |
| 10314154 | System and method for extreme ultraviolet source control | Chun-Chia Hsu, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng, Tzung-Chi Fu +1 more | 2019-06-04 |
| 10274844 | Lithography apparatus and method for protecting a reticle | Jen-Yang Chung, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng | 2019-04-30 |