Issued Patents 2019
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10515816 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more | 2019-12-24 |
| 10514598 | Vacuum-integrated hardmask processes and apparatus | Jeffrey Marks, George Andrew Antonelli, Richard A. Gottscho, Adrien LaVoie, Thomas Knisley +3 more | 2019-12-24 |
| 10490413 | Selective growth of silicon nitride | David Charles Smith | 2019-11-26 |
| 10460930 | Selective growth of SiO2 on dielectric surfaces in the presence of copper | Alexander R. Fox, Colleen Lawlor | 2019-10-29 |
| 10454029 | Method for reducing the wet etch rate of a sin film without damaging the underlying substrate | Andrew John McKerrow | 2019-10-22 |
| 10373840 | Technique to deposit sidewall passivation for high aspect ratio cylinder etch | Eric A. Hudson, Joseph Scott Briggs | 2019-08-06 |
| 10361076 | Gapfill of variable aspect ratio features with a composite PEALD and PECVD method | Hu Kang, Shankar Swaminathan, Jun Qian, Wanki Kim, Bart J. van Schravendijk +1 more | 2019-07-23 |
| 10242866 | Selective deposition of silicon nitride on silicon oxide using catalytic control | David Charles Smith | 2019-03-26 |
| 10199212 | Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide | David Charles Smith | 2019-02-05 |
| 10186426 | Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Samantha Tan, Alexander Kabansky +3 more | 2019-01-22 |
| 10176984 | Selective deposition of silicon oxide | David Charles Smith | 2019-01-08 |