Issued Patents 2019
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10474033 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Douglas A. Buchberger, Jr., Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-11-12 |
| 10431427 | Monopole antenna array source with phase shifted zones for semiconductor process equipment | Srinivas D. Nemani | 2019-10-01 |
| 10358715 | Integrated cluster tool for selective area deposition | Tobin Kaufman-Osborn, Srinivas D. Nemani, Ludovic Godet, Adib Khan | 2019-07-23 |
| 10354843 | Chemical control features in wafer process equipment | Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2019-07-16 |
| 10283321 | Semiconductor processing system and methods using capacitively coupled plasma | Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Kien N. Chuc, Shankar Venkataraman +1 more | 2019-05-07 |
| 10269541 | Workpiece processing chamber having a thermal controlled microwave window | Michael W. Stowell | 2019-04-23 |
| 10240232 | Gas control in process chamber | Srinivas D. Nemani, Ellie Yieh | 2019-03-26 |
| 10224224 | High pressure wafer processing systems and related methods | Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik, Sean S. Kang +1 more | 2019-03-05 |
| 10203604 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Douglas A. Buchberger, Jr., Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-02-12 |
| 10179941 | Gas delivery system for high pressure processing chamber | Adib Khan, Sultan Malik, Keith Tatseun Wong, Srinivas D. Nemani | 2019-01-15 |