| 10446452 |
Method and structure for enabling controlled spacer RIE |
Kangguo Cheng, Ryan O. Jung, Fee Li Lie, Eric R. Miller, Jeffrey C. Shearer +1 more |
2019-10-15 |
| 10438972 |
Sub-fin removal for SOI like isolation with uniform active fin height |
Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Fee Li Lie, Eric R. Miller +1 more |
2019-10-08 |
| 10424663 |
Super long channel device within VFET architecture |
Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Fee Li Lie, Eric R. Miller +1 more |
2019-09-24 |
| 10396181 |
Forming stacked nanowire semiconductor device |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, Jeffrey C. Shearer +1 more |
2019-08-27 |
| 10381437 |
Semiconductor device and method of forming the semiconductor device |
Marc A. Bergendahl, Gauri Karve, Fee Li Lie, Eric R. Miller, Robert R. Robison +1 more |
2019-08-13 |
| 10304689 |
Margin for fin cut using self-aligned triple patterning |
Gauri Karve, Fee Li Lie, Eric R. Miller, Stuart A. Sieg, John R. Sporre |
2019-05-28 |
| 10269931 |
Vertical transport field effect transistor with precise gate length definition |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre |
2019-04-23 |
| 10256326 |
Forming stacked nanowire semiconductor device |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, Jeffrey C. Shearer +1 more |
2019-04-09 |
| 10249762 |
Vertically aligned nanowire channels with source/drain interconnects for nanosheet transistors |
Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre |
2019-04-02 |
| 10249738 |
Nanosheet channel-to-source and drain isolation |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre |
2019-04-02 |
| 10242882 |
Cyclic etch process to remove dummy gate oxide layer for fin field effect transistor fabrication |
Zhenxing Bi, Donald F. Canaperi, Thamarai S. Devarajan |
2019-03-26 |
| 10217634 |
Fin patterns with varying spacing without fin cut |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre |
2019-02-26 |
| 10211055 |
Fin patterns with varying spacing without fin cut |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre |
2019-02-19 |
| 10199503 |
Under-channel gate transistors |
Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Fee Li Lie, Eric R. Miller +1 more |
2019-02-05 |
