Issued Patents 2018
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10043655 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan +3 more | 2018-08-07 |
| 10020188 | Method for depositing ALD films using halide-based precursors | James S. Sims, Ramesh Chandrasekharan, Andrew John McKerrow, Seshasayee Varadarajan, Kathryn M. Kelchner | 2018-07-10 |
| 10008428 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Adrien LaVoie | 2018-06-26 |
| 9875891 | Selective inhibition in atomic layer deposition of silicon-containing films | Dennis M. Hausmann, Bart J. van Schravendijk, Shane Tang, Karl Leeser | 2018-01-23 |