Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10020188 | Method for depositing ALD films using halide-based precursors | Jon Henri, Ramesh Chandrasekharan, Andrew John McKerrow, Seshasayee Varadarajan, Kathryn M. Kelchner | 2018-07-10 |
| 9865455 | Nitride film formed by plasma-enhanced and thermal atomic layer deposition process | Kathryn M. Kelchner | 2018-01-09 |