Issued Patents 2017
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9841687 | Synchronized integrated metrology for overlay-shift reduction | Yung-Yao Lee, Jui-Chun Peng, Yung-Cheng Chen | 2017-12-12 |
| 9814097 | Baking apparatus for priming substrate | Chien-Hung Wang, Ren-Jyh Leu, Shang-Wern Chang | 2017-11-07 |
| 9781773 | Method of heating/cooling a substrate | Jui-Chun Peng, Jacky Chung, Chun-Hung Lin | 2017-10-03 |
| 9772561 | Semiconductor manufacturing method and tool | Yung-Yao Lee, Yi-Ping Hsieh, Ying-Ying Wang | 2017-09-26 |
| 9766559 | Edge-dominant alignment method in exposure scanner system | Yung-Yao Lee, Ying-Ying Wang, Yi-Ping Hsieh | 2017-09-19 |
| 9709904 | Lithography apparatus having dual reticle edge masking assemblies and method of use | Tung-Li Wu, Chin-Hsiang Lin, Jui-Chun Peng | 2017-07-18 |
| 9658536 | In-line inspection and clean for immersion lithography | Tung-Li Wu, Jui-Chun Peng | 2017-05-23 |
| 9640487 | Wafer alignment mark scheme | Wei-Hsiang Tseng, Chao-Hsiung Wang, Chin-Hsiang Lin, Ho-Ping Chen, Jui-Chun Peng | 2017-05-02 |
| 9601324 | Method of making wafer assembly | I-Hsiung Huang, Heng-Jen Lee, Chin-Hsiang Lin | 2017-03-21 |
| 9587929 | Focus metrology method and photolithography method and system | Hung-Ming Kuo, Jui-Chun Peng, Yung-Yao Lee | 2017-03-07 |
| 9563946 | Overlay metrology method and overlay control method and system | Yung-Yao Lee, Ying-Ying Wang, Shang-Wern Chang | 2017-02-07 |