Issued Patents 2017
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9841687 | Synchronized integrated metrology for overlay-shift reduction | Yung-Yao Lee, Heng-Hsin Liu, Yung-Cheng Chen | 2017-12-12 |
| 9826615 | EUV collector with orientation to avoid contamination | Jian-Yuan Su, Hung-Ming Kuo, Kuo-Hung Chao | 2017-11-21 |
| 9781773 | Method of heating/cooling a substrate | Jacky Chung, Heng-Hsin Liu, Chun-Hung Lin | 2017-10-03 |
| 9709904 | Lithography apparatus having dual reticle edge masking assemblies and method of use | Tung-Li Wu, Chin-Hsiang Lin, Heng-Hsin Liu | 2017-07-18 |
| 9658536 | In-line inspection and clean for immersion lithography | Tung-Li Wu, Heng-Hsin Liu | 2017-05-23 |
| 9640487 | Wafer alignment mark scheme | Wei-Hsiang Tseng, Chao-Hsiung Wang, Chin-Hsiang Lin, Heng-Hsin Liu, Ho-Ping Chen | 2017-05-02 |
| 9632426 | In-situ immersion hood cleaning | Heng-Jen Lee | 2017-04-25 |
| 9587929 | Focus metrology method and photolithography method and system | Hung-Ming Kuo, Heng-Hsin Liu, Yung-Yao Lee | 2017-03-07 |