Issued Patents 2017
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9841687 | Synchronized integrated metrology for overlay-shift reduction | Heng-Hsin Liu, Jui-Chun Peng, Yung-Cheng Chen | 2017-12-12 |
| 9772561 | Semiconductor manufacturing method and tool | Heng-Hsin Liu, Yi-Ping Hsieh, Ying-Ying Wang | 2017-09-26 |
| 9766559 | Edge-dominant alignment method in exposure scanner system | Ying-Ying Wang, Yi-Ping Hsieh, Heng-Hsin Liu | 2017-09-19 |
| 9646896 | Lithographic overlay sampling | Yi-Ping Hsieh, Ying-Ying Wang, Shin-Rung Lu | 2017-05-09 |
| 9587929 | Focus metrology method and photolithography method and system | Hung-Ming Kuo, Jui-Chun Peng, Heng-Hsin Liu | 2017-03-07 |
| 9563946 | Overlay metrology method and overlay control method and system | Ying-Ying Wang, Shang-Wern Chang, Heng-Hsin Liu | 2017-02-07 |