Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9709904 | Lithography apparatus having dual reticle edge masking assemblies and method of use | Chin-Hsiang Lin, Heng-Hsin Liu, Jui-Chun Peng | 2017-07-18 |
| 9658536 | In-line inspection and clean for immersion lithography | Heng-Hsin Liu, Jui-Chun Peng | 2017-05-23 |