| 9786607 |
Interconnect structure including middle of line (MOL) metal layer local interconnect on ETCH stop layer |
Sukwon Hong, William J. Taylor, Jr. |
2017-10-10 |
| 9735054 |
Gate tie-down enablement with inner spacer |
Andre P. Labonte, Lars Liebmann, Sanjay C. Mehta |
2017-08-15 |
| 9728462 |
Stable multiple threshold voltage devices on replacement metal gate CMOS devices |
Sivananda K. Kanakasabapathy, Injo Ok, Tenko Yamashita |
2017-08-08 |
| 9728456 |
Interconnect structure including middle of line (MOL) metal layer local interconnect on etch stop layer |
Sukwon Hong, William J. Taylor, Jr. |
2017-08-08 |
| 9653571 |
Freestanding spacer having sub-lithographic lateral dimension and method of forming same |
Hsueh-Chung Chen, Dong-Kwon Kim, Sean Lian, Fee Li Lie, Linus Jang |
2017-05-16 |
| 9627257 |
Gate tie-down enablement with inner spacer |
Andre P. Labonte, Lars Liebmann, Sanjay C. Mehta |
2017-04-18 |
| 9583442 |
Interconnect structure including middle of line (MOL) metal layer local interconnect on etch stop layer |
Sukwon Hong, William J. Taylor, Jr. |
2017-02-28 |
| 9576901 |
Contact area structure and method for manufacturing the same |
Hsueh-Chung Chen, Chih-Chao Yang |
2017-02-21 |
| 9570573 |
Self-aligned gate tie-down contacts with selective etch stop liner |
Lars Liebmann, Ruilong Xie |
2017-02-14 |
| 9570397 |
Local interconnect structure including non-eroded contact via trenches |
Vimal Kamineni, Andre P. Labonte, Ruilong Xie |
2017-02-14 |
| 9536791 |
Stable multiple threshold voltage devices on replacement metal gate CMOS devices |
Sivananda K. Kanakasabapathy, Injo Ok, Tenko Yamashita |
2017-01-03 |
