| 9824921 |
Method and apparatus for placing a gate contact inside a semiconductor active region having high-k dielectric gate caps |
Ruilong Xie, Xunyuan Zhang |
2017-11-21 |
| 9780178 |
Methods of forming a gate contact above an active region of a semiconductor device |
Ruilong Xie, Andreas Knorr |
2017-10-03 |
| 9735054 |
Gate tie-down enablement with inner spacer |
Su Chen Fan, Lars Liebmann, Sanjay C. Mehta |
2017-08-15 |
| 9691897 |
Three-dimensional semiconductor transistor with gate contact in active region |
Ruilong Xie, Andreas Knorr |
2017-06-27 |
| 9640625 |
Self-aligned gate contact formation |
Guillaume Bouche, Andy Wei, Gabriel Padron Wells, Jing Wan |
2017-05-02 |
| 9627257 |
Gate tie-down enablement with inner spacer |
Su Chen Fan, Lars Liebmann, Sanjay C. Mehta |
2017-04-18 |
| 9570397 |
Local interconnect structure including non-eroded contact via trenches |
Su Chen Fan, Vimal Kamineni, Ruilong Xie |
2017-02-14 |
