Issued Patents 2017
Showing 26–35 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9627277 | Method and structure for enabling controlled spacer RIE | Kangguo Cheng, Ryan O. Jung, Eric R. Miller, Jeffrey C. Shearer, John R. Sporre +1 more | 2017-04-18 |
| 9620590 | Nanosheet channel-to-source and drain isolation | Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre, Sean Teehan | 2017-04-11 |
| 9608065 | Air gap spacer for metal gates | Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre, Sean Teehan | 2017-03-28 |
| 9601347 | Forming semiconductor fins with self-aligned patterning | Kangguo Cheng, Peng Xu | 2017-03-21 |
| 9595613 | Forming semiconductor fins with self-aligned patterning | Kangguo Cheng, Peng Xu | 2017-03-14 |
| 9589958 | Pitch scalable active area patterning structure and process for multi-channel finFET technologies | Sivananda K. Kanakasabapathy, Eric R. Miller, Stuart A. Sieg | 2017-03-07 |
| 9583563 | Conformal doping for punch through stopper in fin field effect transistor devices | Huiming Bu, Sivananda K. Kanakasabapathy, Tenko Yamashita | 2017-02-28 |
| 9576979 | Preventing strained fin relaxation by sealing fin ends | Kangguo Cheng, Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve +3 more | 2017-02-21 |
| 9536750 | Method for fin formation with a self-aligned directed self-assembly process and cut-last scheme | Cheng Chi, Chi-Chun Liu, Ruilong Xie | 2017-01-03 |
| 9536744 | Enabling large feature alignment marks with sidewall image transfer patterning | Kangguo Cheng, Sivananda K. Kanakasabapathy, Eric R. Miller, Jeffrey C. Shearer, John R. Sporre +1 more | 2017-01-03 |