| 9786666 |
Method to form dual channel semiconductor material fins |
Kangguo Cheng, Ryan O. Jung, Fee Li Lie, John R. Sporre, Sean Teehan |
2017-10-10 |
| 9754942 |
Single spacer for complementary metal oxide semiconductor process flow |
Marc A. Bergendahl, Kangguo Cheng, Jessica Dechene, Fee Li Lie, Jeffrey C. Shearer +2 more |
2017-09-05 |
| 9748146 |
Single spacer for complementary metal oxide semiconductor process flow |
Marc A. Bergendahl, Kangguo Cheng, Jessica Dechene, Fee Li Lie, Jeffrey C. Shearer +2 more |
2017-08-29 |
| 9728622 |
Dummy gate formation using spacer pull down hardmask |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, John R. Sporre, Sean Teehan |
2017-08-08 |
| 9716184 |
Enabling large feature alignment marks with sidewall image transfer patterning |
Kangguo Cheng, Sivananda K. Kanakasabapathy, Fee Li Lie, Jeffrey C. Shearer, John R. Sporre +1 more |
2017-07-25 |
| 9627277 |
Method and structure for enabling controlled spacer RIE |
Kangguo Cheng, Ryan O. Jung, Fee Li Lie, Jeffrey C. Shearer, John R. Sporre +1 more |
2017-04-18 |
| 9620590 |
Nanosheet channel-to-source and drain isolation |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, John R. Sporre, Sean Teehan |
2017-04-11 |
| 9608065 |
Air gap spacer for metal gates |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, John R. Sporre, Sean Teehan |
2017-03-28 |
| 9589958 |
Pitch scalable active area patterning structure and process for multi-channel finFET technologies |
Sivananda K. Kanakasabapathy, Fee Li Lie, Stuart A. Sieg |
2017-03-07 |
| 9536744 |
Enabling large feature alignment marks with sidewall image transfer patterning |
Kangguo Cheng, Sivananda K. Kanakasabapathy, Fee Li Lie, Jeffrey C. Shearer, John R. Sporre +1 more |
2017-01-03 |
